Characterization of Plasma-Activated, Thermally-Annealed Si-SiO<sub>2</sub> Direct Bond Strength for Vapor HF Etching
Publication date: Available online 28 September 2023Source: Sensors and Actuators A: PhysicalAuthor(s): Tianjiao Gong, Yukio Suzuki, Karla Hiller, Shuji Tanaka